AFM lithography for the definition of nanometre scale gaps: Application to the fabrication of a cantilever-based sensor with electrochemical current detection

Nanotechnology

Volumn 15, Issue 7, 2004, Pages 771-776

  Villarroya, María ^a   Pérez Murano, Francesc ^b   Martín, Cristina ^b   Davis, Zachary ^c   Boisen, Anja ^c   Esteve, Jaume ^b   Figueras, Eduard ^b   Montserrat, Josep ^b   Barniol, Núria ^a  

^a UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^b INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^c TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CANTILEVER BEAMS; ELECTRIC POTENTIAL; ELECTRODES; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS;

CANTILEVER-BASED SENSORS; CLOSE PROXIMITY; CURRENT DETECTION; NANOMETER SCALE GAPS;

ELECTRIC CURRENTS;

EID: 3142767483     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/7/009     Document Type: Article

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