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Volumn 12, Issue 7-9 SPEC. ISS., 2004, Pages 985-991

Cathodic arc deposited thin film coatings based on TiAl intermetallics

Author keywords

A. Titanium aluminides, based on TiAl; B. Tribological properties; C. Coatings, intermetallic and otherwise; C. Hot isostatic pressing; C. Sintering; C. Thin films; G. Wear resistant applications

Indexed keywords

ADHESION; ALUMINUM; ANTIREFLECTION COATINGS; CATHODES; ELASTIC MODULI; HOT ISOSTATIC PRESSING; INTERMETALLICS; PHYSICAL VAPOR DEPOSITION; SINTERING; SPUTTERING; THERMODYNAMIC STABILITY; TITANIUM NITRIDE; WEAR RESISTANCE;

EID: 3142760140     PISSN: 09669795     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.intermet.2004.02.021     Document Type: Conference Paper
Times cited : (31)

References (40)
  • 1
  • 36
    • 3142774509 scopus 로고    scopus 로고
    • GB-232 Sputtering targets and sputtered films: technology and market. Business Communications Co. Inc., 25 Van Zant St, Suite 13, Norwalk, Connecticut, 06855-1781
    • Business Opportunity Report. GB-232 Sputtering targets and sputtered films: technology and market. Business Communications Co. Inc., 25 Van Zant St, Suite 13, Norwalk, Connecticut, 06855-1781.
    • Business Opportunity Report
  • 37
    • 3142705410 scopus 로고    scopus 로고
    • High purity titanium sputtering targets. US patent No. 5,772,860; June 30
    • Sawada S, Fukuyo H, Nagasawa M. High purity titanium sputtering targets. US patent No. 5,772,860; June 30, 1998.
    • (1998)
    • Sawada, S.1    Fukuyo, H.2    Nagasawa, M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.