Structural analysis of (Ti1-xAlx)N graded coatings deposited by reactive magnetron sputtering

Thin Solid Films

Volumn 355, Issue , 1999, Pages 380-384

  Pinkas, M ^a   Pelleg, J ^a   Dariel, M P ^a  

^a BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPOSITION EFFECTS; CRYSTAL MICROSTRUCTURE; ENERGY DISPERSIVE SPECTROSCOPY; GRAIN BOUNDARIES; HIGH RESOLUTION ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; PROTECTIVE COATINGS; SUBSTRATES; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

FUNCTIONALLY GRADED MATERIALS; HARD COATINGS; REACTIVE SPUTTERING; SELECTED AREA ELECTRON DIFFRACTION (SAED);

THIN FILMS;

EID: 0033364924     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00667-7     Document Type: Article

References (14)

1. Münz W.-D. J. Vac. Sci. Technol. A. 4:1986;2717.
2. Konig W., Fritsch R., Kammermeier D. Surf. Coat. Technol. 49:1991;316.
3. Knotek O., Münz W.-D., Leyendecker T. J. Vac. Sci. Technol. A. 5:1987;2173.
4. Leyendecker T., Lammer O., Esser S., Ebberink J. Surf. Coat. Technol. 48:1991;189.
5. Lii D.-F. J. Mater. Sci. 33:1998;2137.
6. Inoue S., Uchida H., Takeshita K., Koterzawa K., Howson R.P. Thin Solid Films. 261:1995;115.
7. Knotek O., Bohmer M., Leyendecker T. J. Vac. Sci. Technol. A. 4:(6):1986;2895.
8. Jehn H.A., Hofman S., Ruckborn V.E., Munz W.D. J. Vac. Sci. Technol. A. 4:(6):1986;2701.
9. Knoteck O., Leyendecker T. J. Solid State Chem. 70:1987;318.
10. Knoteck O., Leyendecker T., Jungblut F. Thin Solid Films. 153:1987;83.
11. J.R. Roos, J.P. Celis, E. Vancoille, et al, Thin Solid Films, 194/194 (1990) 547.
12. Hofmann S. J. Vac. Sci. Technol. A. 4:1986;2789.
13. Lee S.-H., Ryoo H.-J., Lee J.-J. J. Vac. Sci. Technol. A. 12:(4):1994;1602.
14. Hilz G., Holleck H. Mater. Sci. Eng. A. 139:1991;268.