Charge-compensative ion substitution of La3+-substituted bismuth titanate thin films for enhancement of remanent polarization

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 5 A, 2004, Pages 2636-2639

  Uchida, Hiroshi ^a   Okada, Isao ^a   Matsuda, Hirofumi ^b   Iijima, Takashi ^b   Watanabe, Takayuki ^c   Funakubo, Hiroshi ^c  

^a SOPHIA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Bismuth titanate; Chemical solution deposition; Ferroelectrics; Ion substitution; Leakage current density; P E hysteresis loop; Polycrystalline film

Indexed keywords

CURRENT DENSITY; IONS; LEAKAGE CURRENTS; MAGNETIC HYSTERESIS; METALLIC FILMS; MICROSTRUCTURE; POLARIZATION; REMANENCE; SUBSTITUTION REACTIONS;

BISMUTH TITANATE; CHEMICAL SOLUTION DEPOSITION; ION SUBSTITUTION; POLYCRYSTALLINE FILMS;

FERROELECTRIC THIN FILMS;

EID: 3142753544     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.2636     Document Type: Article

References (13)

1. J. Celinska, V. Joshi, S. Narayan, L. D. Macmillan and C. A. Paz De Araujo: Integr. Ferroelectr. 30 (2001) 1.
2. D. Wu, A. Li, T. Zhu, Z. Li, Z. Liu and N. Ming: J. Mater. Res. 16 (2001) 1325.
3. T. Watanabe, A. Saiki, K. Saito and H. Funakubo: J. Appl. Phys. 89 (2001) 3934.
4. S. E. Cummins and L. E. Cross: J. Appl. Phys. 39 (1968) 2268.
5. B. H. Park, B. S. Kang, S. D. Bu, T. W. Noh, J. Lee and W. Jo: Nature 401 (1999) 682.
6. T. Kojima, T. Sakai, T. Watanabe, H. Funakubo, K. Saito and M. Osada: Appl. Phys. Lett. 80 (2002) 2764.
7. H. Uchiida, H. Yoshikawa, I. Okada, H. Matsuda, T. Iijima, T. Watanabe and H. Funakubo: Jpn. J. Appl. Phys. 41 (2002) 6820.
8. H. Uchiida, H. Yoshikawa, I. Okada, H. Matsuda, T. Iijima, T. Watanabe, T. Kojima and H. Funakubo: Appl. Phys. Lett. 81 (2002) 2229.
9. Y. Noguchi and M. Miyayama: Appl. Phys. Lett. 78 (2001) 1903.
10. Y. Noguchi, I. Miwa, Y. Goshima and M. Miyayama: Jpn. J. Appl. Phys. 39 (2000) L1259.
11. T. Watanabe, H. Funakubo, M. Osada, Y. Noguchi and M. Miyayama: Appl. Phys. Lett. 80 (2002) 100.
12. R. D. Shannon: Acta Crystallogr. Sect. A A32 (1976) 751.
13. S. S. Kim, T. K. Song, J. K. Kim and J. Kim: J. Appl. Phys. 92 (2002) 2213.