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Volumn 96, Issue 1, 2004, Pages 777-783
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Comparison of the passivation effects on self- and non-self-aligned InP/InGaAs/InP double heterostructure bipolar transistors by low-temperature deposited SiNx
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Author keywords
[No Author keywords available]
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Indexed keywords
CURRENT VOLTAGE CHARACTERISTICS;
DEGRADATION;
ETCHING;
INTEGRATED OPTOELECTRONICS;
LEAKAGE CURRENTS;
OHMIC CONTACTS;
PASSIVATION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING INDIUM PHOSPHIDE;
SILANES;
SILICON NITRIDE;
SULFUR;
CURRENT GAINS;
GUMMEL PLOTS;
OVERPASSIVATION PROCESSES;
SURFACE RECOMBINATION;
HETEROJUNCTION BIPOLAR TRANSISTORS;
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EID: 3142669371
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1757656 Document Type: Article |
Times cited : (13)
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References (15)
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