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Volumn 96, Issue 1, 2004, Pages 777-783

Comparison of the passivation effects on self- and non-self-aligned InP/InGaAs/InP double heterostructure bipolar transistors by low-temperature deposited SiNx

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DEGRADATION; ETCHING; INTEGRATED OPTOELECTRONICS; LEAKAGE CURRENTS; OHMIC CONTACTS; PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING INDIUM PHOSPHIDE; SILANES; SILICON NITRIDE; SULFUR;

EID: 3142669371     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1757656     Document Type: Article
Times cited : (13)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.