메뉴 건너뛰기




Volumn 43, Issue 5 A, 2004, Pages 2640-2644

Preparation of amorphous hydrogenated carbon films by RF sputtering at a low-hydrogen-flow-rate region for hydrogen-reactive substrates

Author keywords

Amorphous hydrogenated carbon film; Bonding hydrogen concentration; CdTe; Hydrogen reactive substrate; Low hydrogen flow rate; Optical gap; Protective film; RF magnetron sputtering

Indexed keywords

ETCHING; HYDROGEN; HYDROGENATION; MAGNETRON SPUTTERING; REDUCTION; RESIDUAL STRESSES;

EID: 3142662002     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.2640     Document Type: Article
Times cited : (8)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.