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Volumn 43, Issue 5 A, 2004, Pages 2640-2644
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Preparation of amorphous hydrogenated carbon films by RF sputtering at a low-hydrogen-flow-rate region for hydrogen-reactive substrates
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Author keywords
Amorphous hydrogenated carbon film; Bonding hydrogen concentration; CdTe; Hydrogen reactive substrate; Low hydrogen flow rate; Optical gap; Protective film; RF magnetron sputtering
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Indexed keywords
ETCHING;
HYDROGEN;
HYDROGENATION;
MAGNETRON SPUTTERING;
REDUCTION;
RESIDUAL STRESSES;
AMORPHOUS HYDROGENATED CARBON FILMS;
HYDROGEN REACTIVE SUBSTRATES;
LOW HYDROGEN FLOW RATE;
OPTICAL GAP;
AMORPHOUS FILMS;
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EID: 3142662002
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/JJAP.43.2640 Document Type: Article |
Times cited : (8)
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References (14)
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