Design and development of novel monomers and copolymers for 193-nm lithography

Journal of Photopolymer Science and Technology

Volumn 17, Issue 4, 2004, Pages 475-482

  Otake, Atsushi ^b   Araya, Emi ^a   Momose, Hikaru ^a   Ansai, Ryuichi ^a   Tooyama, Masayuki ^a   Fujiwara, Tadayuki ^a  

^a Bio Research Corporation of Yokohama   (Japan)

^b MITSUBISHI CHEMICAL CORPORATION   (Japan)

Author keywords

193 nm lithography; CN group; Copolymer; Monomer; Resist material

Indexed keywords

ACRYLIC ACID; COPOLYMER; MONOMER; NITRILE;

ARGON FLUORIDE LITHOGRAPHY; ARTICLE; CALCULATION; MATERIALS; POLYMERIZATION; SYNTHESIS; TECHNOLOGY;

EID: 3142654228     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.17.475     Document Type: Article

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