Effect of end group structures of methacrylate polymers on ArF photoresist performances

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue 1, 2001, Pages 695-702

  Momose, Hikaru ^a   Wakabayashi, Shigeo ^a   Fujiwara, Tadayuki ^a   Ichimura, Kiyoshi ^a   Nakauchi, Jun ^a  

^a MITSUBISHI CHEMICAL CORPORATION   (Japan)

Author keywords

Alicyclic methacrylate; ArF photoresist; End group structure; Sensitivity

Indexed keywords

COPOLYMERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; POLYACRYLATES; SENSITIVITY ANALYSIS;

END GROUP STRUCTURES;

PHOTORESISTS;

EID: 0034757261     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436903     Document Type: Article

References (7)