Low-birefringence thermally and environmentally stable slab waveguide planarized by hot embossing

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 4 B, 2004, Pages 2341-2345

  Hasui, Kenjiro ^a,b   Tomiki, Masahiro ^a   Okamoto, Naomichi ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

^b Worldwide Product Engineering   (Japan)

Author keywords

Birefringence; Environmental stability; Hot embossing; Radiative striation; Silsesquioxane; Thermal stability

Indexed keywords

ANODIC POLARIZATION; ATMOSPHERIC HUMIDITY; BIREFRINGENCE; DIFFRACTION GRATINGS; MONOLAYERS; OXIDATION; PHOTOLITHOGRAPHY; RADIATION; REACTIVE ION ETCHING; REFRACTIVE INDEX; SPIN COATING; THERMODYNAMIC STABILITY;

ENVIRONMENTAL STABILITY; HOT EMBOSSING; RADIATIVE STRIATION; SILSESQUIOXANE;

WAVEGUIDES;

EID: 3142637012     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.2341     Document Type: Conference Paper

References (26)

1. L. Eldada and L. W. Shacklette: IEEE J. Sel. Top. Quantum Electron. 6 (2000) 54.
2. T. Koregana, H. Asakura and M. Umetani: Proc. Int. Plastic Optical Fiber Conf. 1999 (1999) p. 153.
3. P. M. Pern and L. W. Shaklette: Proc. SPIE 4106 (2000) 1.
4. J.-S. Kim, J.-W. Kang and J.-J. Kim: Jpn. J. Appl. Phys. 42 (2003) 1277.
5. T. Shioda: Jpn. J. Appl. Phys. 41 (2002) L1126.
6. O. Sugihara and N. Okamoto: Proc. SPIE 4991 (2003) 366.
7. J.-W. Kang, J.-P. Kim, W.-Y. Lee, J.-S. Kim, J.-S. Lee and J.-J. Kim: J. Lightwave Technol. 19 (2001) 872.
8. H. Schmidt: Better Ceramics through Chemistry I, eds. C. J. Brinker, D. E. Clark and D. R. Ulrich (North-Holland, New York, 1984) p. 327; through J. Non-Cryst Solid. 210 (1997) 187.
9. H. Schmidt: Better Ceramics through Chemistry I, eds. C. J. Brinker, D. E. Clark and D. R. Ulrich (North-Holland, New York, 1984) p. 327; through J. Non-Cryst Solid. 210 (1997) 187.
10. G. C. Righini and S. Pelli: J. Sol-Gel Sci. Technol. 8 (1997) 991.
11. R. Buestrich, F. Kahlengberg and M. Popall: J. Sol-Gel Sci. Technol. 20 (2001) 181.
12. S. I. Najafi, T. Touam, R. Sara, M. P. Andrews and M. A. Fardad: J. Lightwave Technol. 16 (1998) 1640.
13. K. Hasui, I. Takagaki, O. Sugihara and N. Okamoto: Proc. SPIE 4991 (2003) 355.
14. X. M. Du, X. Orignac and R. M. Almeida: J. Am. Ceram. Soc. 78 (1995) 2254.
15. H. Kozuka and M. Hirano: J. Sol-Gel Sci. Technol. 19 (2000) 501.
16. R. Maboudian and R. T. Howe: J. Vac. Sci. & Technol. B15 (1997) 1.
17. J. Peanasky, H. M. Schneider and S. Granick: Langmuir 11 (1995) 953.
18. C. C. Teng: Appl. Opt. 32 (1993) 1051.
19. G. R. Atkins, R. M. Krolikowska and A. Samoc: J. Non-Cryst. Solids 265 (2000) 210.
20. J. Kobayashi, T. Matsuura, Y. Hida, S. Sasaki and T. Maruno: J. Lightwave Technol. 16 (1998) 1024.
21. J.-W. Kang, J.-P. Kim, J.-S. Lee and J.-J. Kim: Proc. SPIE 4805 (2002) 9.
22. R. Yoshimura, M. Hikita, S. Tomaru and S. Imamura: J. Lightwave Technol. 16 (1998) 1030.
23. T. Watanabe, N. Ooba, S. Hayashida, T. Kurihara and S. Imamura: J. Lightwave Technol. 16 (1998) 1049.
24. S. H. Baek, J.-W. Kang, X. D. Li, M.-H. Lee and J.-J. Kim: Proc. SPIE 4991 (2003) 406.
25. K. S. Brown, B. J. Taylor, L. A. Hornak and T. W. Weidman: IEEE Photon. Technol. Lett. 9 (1997) 791.
26. D. E. Katsoulis, M. Suto and N. Kushibiki: Proc. SPIE 4991 (2003) 392.