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Journal of Applied Physics

Volumn 95, Issue 12, 2004, Pages 8481-8483

Profile of optical constants of SiO 2 thin films containing Si nanocrystals

(5) Chen, T P a Liu, Y a Tse, M S a Fung, S b Dong, Gui c

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b UNIVERSITY OF HONG KONG (Hong Kong)

c INSTITUTE OF MICROELECTRONICS (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DEPTH PROFILES; OPTICAL CONSTANTS; SUBLAYERS;

APPROXIMATION THEORY; CMOS INTEGRATED CIRCUITS; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; OPTOELECTRONIC DEVICES; RAPID THERMAL ANNEALING; REFRACTIVE INDEX; SECONDARY ION MASS SPECTROMETRY; SILICA; SILICON; SYNTHESIS (CHEMICAL); VOLUME FRACTION; X RAY DIFFRACTION ANALYSIS;

THIN FILMS;

EID: 3142563200 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1739282 Document Type: Article

Times cited : (11)

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