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Journal of Applied Physics

Volumn 84, Issue 9, 1998, Pages 5210-5217

Characterization of Si+ ion-implanted SiO2 films and silica glasses

(1) Guha, Soumvendu a

a NAVAL RESEARCH LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000867403 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.368812 Document Type: Article

Times cited : (61)

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