Direct UV patterning of waveguide devices in As2Se3 thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 3, 2004, Pages 1044-1047

  Bryce, R M ^a,b   Nguyen, H T ^a,b   Nakeeran, P ^a,b   Decorby, R G ^a,b   Dwivedi, P K ^a,b   Haugen, C J ^a,b   McMullin, J N ^a,b   Kasap, S O ^a,b  

^a UNIVERSITY OF ALBERTA   (Canada)

^b UNIVERSITY OF SASKATCHEWAN   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ARSENIC COMPOUNDS; DEPOSITION; ETCHING; EVAPORATION; PHOTOCHROMISM; PHOTOLITHOGRAPHY; REFRACTIVE INDEX; SPECTROPHOTOMETERS; STIMULATED EMISSION; THERMAL EXPANSION; ULTRAVIOLET RADIATION; WAVEGUIDES;

CHALCOGENIDE GLASSES; INTERFERENCE FRINGES; PHOTODOPING; TRANSMISSION SPECTRA;

THIN FILMS;

EID: 3142533343     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1691081     Document Type: Conference Paper

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