Compositional study of silicon oxynitride thin films deposited using electron cyclotron resonance plasma-enhanced chemical vapor deposition technique

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 3, 2005, Pages 545-550

  Baumann, H ^a   Sah, R E ^b  

^a GOETHE UNIVERSITY   (Germany)

^b FRAUNHOFER INSTITUTE FOR APPLIED SOLID STATE PHYSICS IAF   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; DEPOSITION; ELECTRON CYCLOTRON RESONANCE; INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILANES; THIN FILMS;

NITROUS OXIDE; NONBONDED NITROGEN ATOMS; SILICON OXYNITRIDE;

SILICON COMPOUNDS;

EID: 31144447655     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1901665     Document Type: Article

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