Characterization of silicon oxynitride films using ion beam analysis techniques

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 170, Issue 3, 2000, Pages 461-466

  Walker, S R ^a   Davies, J A ^a   Mascher, P ^a   Wallace, S G ^a   Lennard, W N ^b   Massoumi, G R ^b   Elliman, R G ^c   Ophel, T R ^c   Timmers, H ^c  

^a MCMASTER UNIVERSITY   (Canada)

^b UNIVERSITY OF WESTERN ONTARIO   (Canada)

^c AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

HEAVY IONS; ION BEAMS; THIN FILMS;

HEAVY-ION ELASTIC RECOIL DETECTION ANALYSIS (HIERDA); ION BEAM ANALYSIS; NUCLEAR REACTION ANALYSIS; SILICON OXYNITRIDE;

SILICON NITRIDE;

EID: 0034301813     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(00)00239-1     Document Type: Article

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