Defects in silicon oxynitride films

Thin Solid Films

Volumn 424, Issue 1, 2003, Pages 148-151

  Futatsudera, M ^a   Kimura, T ^a   Matsumoto, A ^a   Inokuma, T ^a   Kurata, Y ^a   Hasegawa, S ^a  

^a KANAZAWA UNIVERSITY   (Japan)

Author keywords

Electron spin resonance (ESR); Glow discharge; Silicon nitride; Silicon oxide

Indexed keywords

CRYSTAL DEFECTS; DEPOSITION; GLOW DISCHARGES; PARAMAGNETIC RESONANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS; STOICHIOMETRY;

CHARGE-TRAP CENTRES;

AMORPHOUS FILMS;

EID: 0037460308     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00917-3     Document Type: Article

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