Real time quantitative diagnostic technique for measuring chemical vapor deposition precursors

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 1267-1269

  Yun, Ju Young ^a   Chung, Kwang Hwa ^a   Moon, Doo Kyung ^b  

^a Korea Research Institute of Standards and Science   (South Korea)

^b Konkuk University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; CHEMICAL VAPOR DEPOSITION; LIQUID LEVEL INDICATORS; SEMICONDUCTOR MATERIALS; SENSORS; ULTRASONIC DEVICES;

PRECURSOR CONSUMPTION; ULTRASONIC SENSORS;

REAL TIME SYSTEMS;

EID: 31044439993     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1913681     Document Type: Conference Paper

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