A new system design for the preparation of copper/activated carbon catalyst by metal-organic chemical vapor deposition method

Chemical Engineering Science

Volumn 58, Issue 3-6, 2003, Pages 687-695

  Lam, Frank L Y ^a   Hu, Xijun ^a  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

Catalysis; Catalyst support; MOCVD; Porous media; SEM EDX

Indexed keywords

CATALYSTS; ENERGY DISPERSIVE SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTIMIZATION; POROUS MATERIALS; SCANNING ELECTRON MICROSCOPY; SYSTEMS ANALYSIS; X RAY DIFFRACTION ANALYSIS;

METALLIC CATALYSTS;

ACTIVATED CARBON;

VAPOR DEPOSITION;

EID: 0037292919     PISSN: 00092509     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2509(02)00596-1     Document Type: Article

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