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Volumn 23, Issue 6, 2005, Pages 1698-1705

In situ photovoltage measurements using femtosecond pump-probe photoelectron spectroscopy and its application to metal-HfO 2-Si structures

Author keywords

[No Author keywords available]

Indexed keywords

FEMTOSECOND LASER; IN SITU PHOTOVOLTAGE MEASUREMENTS; NONCONTACT NONINVASIVE MEASUREMENT;

DIELECTRIC MATERIALS; FERMI LEVEL; LASER PULSES; MOS DEVICES; RAPID THERMAL ANNEALING; SILICON;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 31044439256 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.2083909 Document Type: Article

Times cited : (25)

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