Deposition of high quality thin films using ECR plasma

Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering

Volumn 66, Issue 4, 2000, Pages 511-516

  Amazawa, Takao ^a   Oikawa, Hideo ^a   Hirono, Sigeru ^a   Matsuo, Seitaro ^a  

^a NONE

Author keywords

Aluminum oxide film; Amorphous carbon film; ECR; Electron cyclotron resonance; Silicon dioxide film

Indexed keywords

EID: 31044438614     PISSN: 09120289     EISSN: None     Source Type: Journal    
DOI: 10.2493/jjspe.66.511     Document Type: Article

References (14)

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