EUV characteristics of a high power and high repetition rate CO2 laser driven Xe plasma

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5918, Issue , 2005, Pages 1-8

  Komori, Hiroshi ^a   Ueno, Yoshifumi ^a   Hoshino, Hideo ^a   Ariga, Tatsuya ^a   Endo, Akira ^a  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

Co2 Laser; EUV light source; Laser produced plasma; Xe plasma

Indexed keywords

CARBON DIOXIDE; LASER PRODUCED PLASMAS; LIGHT SOURCES; MIRRORS; OSCILLATORS (ELECTRONIC); PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

CO2 LASER; EUV LIGHT SOURCES; XE PLASMA;

PLASMA JETS;

EID: 30844445377     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.616051     Document Type: Conference Paper

References (7)

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3. 2 Laser-Produced Xenon Plasma", Jpn. J. Appl. Phys. 43, L585, 2004
4. David Attwood, Soft X-rays and Extreme Ultraviolet Radiation, Cambridge University Press (2000), Chapter 6, p221.
5. Y. Teramoto, H. Sato, K. Bessho, K. Miyauchi, M. Ikeuchi, K. Okubo, M. Yoshioka, K. Toyoda, "Development of Xe-filled capillary discharge extreme ultraviolet radiation source for semiconductor lithography", Proc. SPIE, 5037, 767-775, 2003.
6. A. Endo, T. Abe, T. Suganuma, Y. Imai, H. Someya, H. Hoshino, M Nakano, G. Soumagne, H. Komori, Y. Takabayashi, H. Mizoguchi, "Design of high average power clean EUV light source based on laser produced Xenon plasma", Proc. SPIE, 5196, 256-262, 2004.
7. H. Komori, Y. Imai, G. Soumagne, T. Abe, T. Suganuma, A. Endo, "Magnetic field ion mitigation for EUV light sources", Proc. SPIE, 5751, 859-866, 2005.