Characterisation of TiN and TiAlN thin films deposited on ground surfaces using focused ion beam milling

Journal of Materials Science

Volumn 39, Issue 11, 2004, Pages 3569-3575

  Cairney, J M ^a   Harris, S G ^b   Ma, L W ^a   Munroe, P R ^a   Doyle, E D ^b  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

^b SWINBURNE UNIVERSITY OF TECHNOLOGY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; COMMINUTION; CRYSTAL MICROSTRUCTURE; DEFORMATION; ION BEAM ASSISTED DEPOSITION; PHYSICAL VAPOR DEPOSITION; SHEAR STRESS; THIN FILM CIRCUITS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

GROUND SURFACES; MACROSTRUCTURES; SECTIONAL IMAGING; SHEAR CRACKING;

TITANIUM NITRIDE;

EID: 3042777880     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JMSC.0000030708.70303.80     Document Type: Article

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