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Volumn , Issue , 2004, Pages 129-132

On-chip tensile test for epitaxial polysilicon

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELASTIC MODULI; EPITAXIAL GROWTH; FINITE ELEMENT METHOD; FRACTURE TOUGHNESS; MICROPROCESSOR CHIPS; POLYSILICON; TENSILE TESTING;

EID: 3042702985     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (7)

References (8)
  • 1
    • 0036504397 scopus 로고    scopus 로고
    • A new microtensile tester for the study of MEMS materials with the aid of atomic force microscopy
    • I. Chasiotis, W.G. Knauss, "A New Microtensile Tester for the Study of MEMS Materials with the aid of Atomic Force Microscopy", Experimental Mechanics, vol. 42(1), pp. 51-57,2002.
    • (2002) Experimental Mechanics , vol.42 , Issue.1 , pp. 51-57
    • Chasiotis, I.1    Knauss, W.G.2
  • 2
    • 0033749085 scopus 로고    scopus 로고
    • Fracture toughness of polysilicon MEMS devices
    • H. Kahn, et al. "Fracture toughness of polysilicon MEMS devices", Sensor and Actuators A 82, 2000, 274-280.
    • (2000) Sensor and Actuators A , vol.82 , pp. 274-280
    • Kahn, H.1
  • 3
    • 0035425941 scopus 로고    scopus 로고
    • Surface micromachined ring test structures to determine mechanical properties of compressive thin films
    • T. Kramer, O. Paul "Surface Micromachined ring test structures to determine mechanical properties of compressive thin films", Sensor and Actuators A, 2000; 92, 292-298.
    • (2000) Sensor and Actuators A , vol.92 , pp. 292-298
    • Kramer, T.1    Paul, O.2
  • 4
    • 0031168990 scopus 로고    scopus 로고
    • M-Test: A test chip for MEMS material property measurement using electrostatically actuated test structures
    • P.M. Oostemberg, S.D. Senturia "M-Test: a test chip for MEMS material property measurement using electrostatically actuated test structures", J. Microelectromech. Syst, 1997; 6, 107-118.
    • (1997) J. Microelectromech. Syst , vol.6 , pp. 107-118
    • Oostemberg, P.M.1    Senturia, S.D.2
  • 7
    • 3042811872 scopus 로고    scopus 로고
    • Thelma Process
    • STMicroelectronics, Milano, Italy
    • Thelma Process. Internal thecnical report, STMicroelectronics, Milano, Italy.
    • Internal Thecnical Report
  • 8
    • 0038237138 scopus 로고    scopus 로고
    • Fracture strength of polysilicon at stress concentrations
    • J. Bagdahn, W.N. Sharpe Jr, "Fracture strength of polysilicon at stress concentrations", J. Microelectromech. Syst, vol. 12, pp. 302-312, 2003.
    • (2003) J. Microelectromech. Syst , vol.12 , pp. 302-312
    • Bagdahn, J.1    Sharpe Jr., W.N.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.