Enhanced strain relaxation in a two-step process of GexSi 1-x/Si(001) heterostructures grown by low-temperature molecular-beam epitaxy

Applied Physics Letters

Volumn 84, Issue 23, 2004, Pages 4599-4601

  Bolkhovityanov, Yu B ^a   Deryabin, A S ^a   Gutakovskii, A K ^a   Revenko, M A ^a   Sokolov, L V ^a,b  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^b TOMSK STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; DEFECTS; DISLOCATIONS (CRYSTALS); HETEROJUNCTIONS; ION IMPLANTATION; MOLECULAR BEAM EPITAXY; MONOCHROMATORS; SEMICONDUCTOR GROWTH; STRAIN; TRANSMISSION ELECTRON MICROSCOPY;

ELASTIC DEFORMATION; ELASTIC STRAINS; PLASTIC RELAXATION;

GERMANIUM COMPOUNDS;

EID: 3042545391     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1734683     Document Type: Article

References (14)

1. S. B. Samavedam and E. A. Fitzgerald, J. Appl. Phys. 81, 3108 (1997).
2. H.-J. Herzog, T. Hackbarth, G. Hock, M. Zeuner, and U. König, Thin Solid Films 380, 36 (2000).
3. E. A. Fitzgerald and S. B. Samavedam, Thin Solid Films 294, 3 (1997).
4. W.-X. Ni, K. Lyutovich, J. Alami, C. Tengstedt, M. Bauer, and E. Kasper, J. Cryst. Growth 227, 756 (2001).
5. R. Hull, J. C. Bean, J. M. Bonar, G. S. Higashi, K. T. Short, H. Temkin, and A. E. White, Appl. Phys. Lett. 56, 2445 (1990).
6. M. Luysberg, D. Kirch, H. Trinkaus, B. Holländer, St. Lenk, S. Mantl, H.-J. Herzog, T. Hackbarth, and P. F. P. Fichtner, J. Appl. Phys. 92, 4290 (2002).
7. K. Sawano, Y. Hirose, S. Koh, K. Nakagawa, T. Hattori, and Y. Shiraki, J. Cryst. Growth 251, 685 (2003).
8. Y. B. Bolkhovityanov, A. K. Gutakovskii, V. I. Mashanov, O. P. Pchelyakov, M. A. Revenko, and L. V. Sokolov, J. Appl. Phys. 91, 4710 (2002).
9. J. W. Matthews and A. E. Blakeslee, J. Cryst. Growth 27, 118 (1974).
10. H. Chen, L. W. Guo, Q. Cui, Q. Hu, Q. Huang, and J. M. Zhou, J. Appl. Phys. 79, 1167 (1996).
11. D. C. Houghton, J. Appl. Phys. 70, 2136 (1991).
12. Y. B. Bolkhovityanov, A. K. Gutakovskii, V. I. Mashanov, O. P. Pchelyakov, M. A. Revenko, and L. V. Sokolov, Thin Solid Films 392, 98 (2001).
13. D. D. Perovic, G. C. Weatherly, J-M. Baribeau, and D. C. Houghton, Thin Solid Films 183, 141 (1989).
14. Y. B. Bolkhovityanov, O. P. Pchelyakov, L. V. Sokolov, and S. I. Chikichev, Semiconductors 37, 493 (2003).