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Volumn 71, Issue 2 II, 2000, Pages 800-803

Microwave plasma source for high current ion beam neutralization

Author keywords

[No Author keywords available]

Indexed keywords


EID: 3042527311     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1150298     Document Type: Article
Times cited : (11)

References (12)
  • 6
    • 0030363828 scopus 로고    scopus 로고
    • Optimization of secondary electron flood design for the production of low energy electrons
    • Austin, TX, June 16-21, edited by E. Ishida et al. Proc. IEEE , New York
    • R. N. Reece et al. "Optimization of secondary electron flood design for the production of low energy electrons" Proceedings of the 11th International Conference on Ion Implantation Technology, Austin, TX, June 16-21, edited by E. Ishida et al. (Proc. IEEE , New York, 1997, pp. 325-318).
    • (1997) Proceedings of the 11th International Conference on Ion Implantation Technology , pp. 325-1318
    • Reece, R.N.1
  • 7
    • 0030368342 scopus 로고    scopus 로고
    • Plasma flood system - Physics of low energy electron generation, plasma coupling, electron transport and surface charge neutralization on wafer
    • Austin, TX, June 16-21
    • H. Ito and M. I. Current "Plasma flood system - physics of low energy electron generation, plasma coupling, electron transport and surface charge neutralization on wafer," 11th International Conference on Ion Implantation Technology, Austin, TX, June 16-21 1996.
    • (1996) 11th International Conference on Ion Implantation Technology
    • Ito, H.1    Current, M.I.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.