Charge control for high-current ion implant

Solid State Technology

Volumn 40, Issue 6, 1997, Pages 101-108

  Erokhin, Yuri ^a,b,c   Reece, Ronald N ^a   Simonton, Robert B ^a  

^a EATON CORPORATION   (United States)

^b MOSCOW INSTITUTE OF PHYSICS AND TECHNOLOGY   (Russian Federation)

^c RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CHARGE; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC VARIABLES CONTROL; ELECTRON TRANSPORT PROPERTIES; IONIZATION OF GASES; OXIDES; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SILICON WAFERS; ELECTRIC CONDUCTIVITY; ELECTRIC POTENTIAL; ELECTROSTATICS; ION BEAMS; ION BOMBARDMENT; ION IMPLANTATION; RADIATION DAMAGE;

PLASMA ELECTRON FLOOD (PEF); SECONDARY ELECTRON FLOOD (SEF); WAFER-CHARGE CONTROL; ELECTRIC CHARGE CONTROL; HIGH CURRENT ION IMPLANTATION; PLASMA ELECTRON FLOODS (PEF); SECONDARY ELECTRON FLOODS (SEF);

ION IMPLANTATION; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 5244268783     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (10)

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3. H. Shin, K. Noguchi, C. Hu, "Modeling Oxide Thickness Dependence of Charging Damage by Plasma Processing," IEEE Electron Device Letters, Vol. 14, No. 11, p. 509, 1993.
4. H. Muto, H. Fujii, K. Nakanishi, S. Ikeda, IEEE Transactions on Electron Devices, Vol. 38, p. 1300, 1991.
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6. F. Sinclair, "Gate Oxides in High Current Implanters: How Do They Survive?" Nucl. Instr. and Meth., Vol. B55, p. 115, 1991.
7. M.C. Vella, W. Lukaszek, M.I. Current, N.H. Tripsas, "Plasma Model for Charging Damage," Nucl. Instr. and Meth., Vol. B96, p. 48, 1995.
8. R.N. Reece et al., "Optimizaion of the Secondary Electron Flood Design for the Production of Low Energy Electrons,"Proceedings of VII International Conference on Ion Implantation Technology, Austin, TX, June, 1996, in press
9. C.P. Wu, F. Kolondra, "Wafer Charging Control in High Current Ion Implanters,"; J. Electrochem. Soc., Vol. 138, p. 3100, 1991.
10. K. Lai, K. Kumar, A. Chou, J.C. Lee, "Effect of Oxide Exposure, Photoresist and Dopant Activation on Plasma Damage Immunity of Ultrathin Oxides and Oxynitrides," IEDM, p.319, 1995.