Optimization of secondary electron flood design for the production of low energy electrons

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 315-318

  Reece, R N ^a   Erokhin, Y ^a   Simonton, R ^a   Freer, B ^a   Lin, Kuang Lun ^a   Lin, Frank Pohua ^a  

^a EATON CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC BREAKDOWN OF SOLIDS; ELECTRIC CHARGE; ION IMPLANTATION; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

CHARGE DISTRIBUTION CONTROL; SECONDARY ELECTRON FLOOD (SEF);

ION BEAMS;

EID: 0030363828     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)