|
Volumn 5374, Issue PART 1, 2004, Pages 405-412
|
Theoretical simulation of extreme UV radiation source for lithography
a b d d h g f c c e d b j i |
Author keywords
[No Author keywords available]
|
Indexed keywords
LASER ENERGY;
PINHOLE GRATINGS;
RADIATION ENERGY;
TRANSMISSION GRATING SPECTROMETER (TGS);
BANDWIDTH;
COMPUTER SIMULATION;
HYDRODYNAMICS;
LASER BEAM EFFECTS;
OPACITY;
SPECTROMETERS;
ULTRAVIOLET RADIATION;
LITHOGRAPHY;
|
EID: 3843119797
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.534989 Document Type: Conference Paper |
Times cited : (3)
|
References (7)
|