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Volumn 5374, Issue PART 1, 2004, Pages 405-412

Theoretical simulation of extreme UV radiation source for lithography

Author keywords

[No Author keywords available]

Indexed keywords

LASER ENERGY; PINHOLE GRATINGS; RADIATION ENERGY; TRANSMISSION GRATING SPECTROMETER (TGS);

EID: 3843119797     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534989     Document Type: Conference Paper
Times cited : (3)

References (7)
  • 1
    • 85022632162 scopus 로고
    • OSA Tech. Digest Set. Opt. Soc. Am
    • For example "Soft-X-ray Projection Lithography", Vol. 12, OSA Tech. Digest Set. (Opt. Soc. Am. 1991).
    • (1991) Soft-X-ray Projection Lithography , vol.12
  • 3
    • 0030107465 scopus 로고
    • Conversion efficiencies from laser-produced plasmas in the extreme ultraviolet regime
    • R. C. SPITZER, T. J. ORZECHOWSKI, D. W. PHILLION, R. L. KAUFMANN, and C. CERJAN, "Conversion Efficiencies from Laser-produced Plasmas in the Extreme Ultraviolet Regime", J. Appl. Phys. 79, 2251 (1993).
    • (1993) J. Appl. Phys. , vol.79 , pp. 2251
    • Spitzer, R.C.1    Orzechowski, T.J.2    Phillion, D.W.3    Kaufmann, R.L.4    Cerjan, C.5
  • 5
    • 0020175657 scopus 로고
    • Scaling Laws of Plasma Ablation by Thermal Radiation
    • K. NISHIHARA, "Scaling Laws of Plasma Ablation by Thermal Radiation", Jpn. J. Appl. Phys. 21, L571 (1982).
    • (1982) Jpn. J. Appl. Phys. , vol.21
    • Nishihara, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.