Preparation and characterization of GaN films by radio frequency magnetron sputtering and carbonized-reaction technique

Applied Surface Science

Volumn 252, Issue 6, 2006, Pages 2153-2158

  Zhang, C G ^a   Chen, W D ^a   Bian, L F ^a   Song, S F ^a   Hsu, C C ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

Carbonized reaction; Gallium nitride films; Gallium Oxide

Indexed keywords

CARBONATION; NATURAL FREQUENCIES; REACTION KINETICS; SPUTTERING; THERMAL EFFECTS; THIN FILMS;

CARBONIZED-REACTION; GALLIUM NITRIDE FILMS; GALLIUM OXIDE; WURTZITE;

GALLIUM NITRIDE;

EID: 30144437757     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.03.209     Document Type: Article

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