Lifetime testing of EUV optics using intense synchrotron radiation at the PTB radiometry laboratory

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4506, Issue , 2001, Pages 105-112

  Klein, R ^a   Gottwald, A ^a   Scholze, F ^a   Thornagel, R ^a   Tummler J ^a   Ulm, G ^a   Wedowski, M ^b   Stietz, F ^b   Mertens, B ^c   Koster, N ^c   Van Elp, J ^c  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b CARL ZEISS SMT AG   (Germany)

^c TNO   (Netherlands)

Author keywords

EUV optics; Extreme ultraviolet lithography; Multilayer mirrors; Reflectometry; Surface contamination; Synchrotron radiation

Indexed keywords

COMPUTER SIMULATION; DEGRADATION; MIRRORS; MULTILAYERS; REFLECTOMETERS; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY;

LITHOGRAPHY;

EID: 2542471970     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.450950     Document Type: Article

References (9)

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