Roads to ultrathin silicon oxides

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 1, 2005, Pages 201-207

  Morgen, P ^a   Bahari, A ^a   Robenhagen, U ^a   Andersen, J F ^a   Hansen, J K ^a   Pedersen, K ^b   Rao, M G ^c   Li, Z S ^d  

^a UNIVERSITY OF SOUTHERN DENMARK   (Denmark)

^b AALBORG UNIVERSITY   (Denmark)

^c INDIAN INSTITUTE OF SCIENCE   (India)

^d AARHUS UNIVERSITY   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ANNEALING; CATALYSIS; CMOS INTEGRATED CIRCUITS; MICROELECTRONICS; SILICON COMPOUNDS; ULTRAHIGH VACUUM;

LOW THERMAL BUDGET; ULTRATHIN GATE DIELECTRICS;

THIN FILMS;

EID: 29744461281     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1842113     Document Type: Article

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