Fast diffusion mechanism of silicon tri-interstitial defects

Physical Review B - Condensed Matter and Materials Physics

Volumn 72, Issue 24, 2005, Pages

  Du, Yaojun A ^a   Barr, Stephen A ^b   Hazzard, Kaden R A ^c   Lenosky, Thomas J ^a   Hennig, Richard G ^a   Wilkins, John W ^a  

^a OHIO STATE UNIVERSITY   (United States)

^b University of Illinois at Urbana Champaign   (United States)

^c Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 29744444164     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.72.241306     Document Type: Article

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