CMOS-compatible micromachined edge-suspended spiral inductors with high Q-factors and self-resonance frequencies

IEEE Electron Device Letters

Volumn 25, Issue 6, 2004, Pages 363-365

  Chen, Kevin J ^a   Hon, Wai Cheong ^a   Zhang, Jinwen ^a,b   Leung, Lydia L W ^a  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^b PEKING UNIVERSITY   (China)

Author keywords

Current crowding; Edge suspended inductors; ICP DRIE etching; Micromachining; Proximity effect; Tetramethyl ammonium hydroxide (TMAH) anisotropic silicon etching

Indexed keywords

AMMONIUM COMPOUNDS; ELECTRIC INDUCTORS; ETCHING; MICROMACHINING; NATURAL FREQUENCIES; SEMICONDUCTING SILICON;

EDGE SUSPENDED INDUCTORS; EDGE SUSPENDED SPIRAL INDUCTORS; Q FACTORS; SELF RESONANCE FREQUENCIES; TETRAMETHYL AMMONIUM HYDROXIDE;

CMOS INTEGRATED CIRCUITS;

EID: 2942702310     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2004.829004     Document Type: Letter

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