Plasma-charging damage of floating MIM capacitors

IEEE Transactions on Electron Devices

Volumn 51, Issue 6, 2004, Pages 1017-1024

  Wang, Zhichun ^a,b   Ackaert, Jan ^c   Salm, Cora ^a   Kuper, Fred G ^a,b   Tack, Marnix ^c   De Backer, Eddy ^c   Coppens, Peter ^c   De Schepper, Luc ^c   Vlachakis, Basil ^c  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b NXP SEMICONDUCTORS   (Netherlands)

^c ON SEMICONDUCTOR   (United States)

Author keywords

Antenna ratio (AR); Metal insulator metal (MIM); Plasma charging damage (PCD)

Indexed keywords

ANTENNAS; CAPACITORS; COMPUTER SIMULATION; PLASMAS; SILICON NITRIDE;

ANTENNA RATIO; METAL INSULATOR METAL CAPACITOR; PLASMA CHARGING DAMAGE;

MIM DEVICES;

EID: 2942679267     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2004.829518     Document Type: Article

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