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Volumn 95, Issue 11 I, 2004, Pages 6048-6053

Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides

Author keywords

[No Author keywords available]

Indexed keywords

GATE DEPLETION; THERMAL PROCESSING; TIME-RESOLVED REFLECTANCE (TRR); ULTRATHIN GATE OXIDES;

EID: 2942677134     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1719267     Document Type: Article
Times cited : (2)

References (29)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.