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Volumn 135, Issue 2-3, 2004, Pages 149-153

Photoionization cross-sections and asymmetry parameters for GeH4 in the VUV region

Author keywords

GeH4; Photoionization asymmetry parameters; Photoionization cross sections; SVIM

Indexed keywords

ELECTRONIC STRUCTURE; PHOTOCHEMICAL REACTIONS; PHOTOIONIZATION; PHOTONS; SEMICONDUCTOR MATERIALS; SILANES; ULTRAVIOLET RADIATION;

EID: 2942662187     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2004.03.001     Document Type: Article
Times cited : (2)

References (30)
  • 2
    • 2942646056 scopus 로고
    • Report of investigation and research on new electronic materials XIII
    • Nippon Denshi Kogyo Shinko Kyokai, Tokyo, Japan (in Japanese)
    • The Committee of Electronic Materials and Technology (Ed.), Report of Investigation and Research on New Electronic Materials XIII, Report of Investigation on Photoexcited Processing Technology 2, Nippon Denshi Kogyo Shinko Kyokai, Tokyo, Japan, 1987 (in Japanese).
    • (1987) Report of Investigation on Photoexcited Processing Technology , vol.2
  • 28
    • 2942680859 scopus 로고    scopus 로고
    • private communication
    • C.E. Brion, 1999, private communication.
    • (1999)
    • Brion, C.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.