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Volumn 92, Issue 9, 2002, Pages 4959-4967

Properties of polymorphous silicon-germanium alloys deposited under high hydrogen dilution and at high pressure

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATRICES; CHARACTERISTIC TIME; DEEP DEFECTS; DENSITY OF STATE; EMISSION ENERGIES; ENHANCED STABILITY; GE CONTENT; HIGH PRESSURE; HYDROGEN DILUTION; HYDROGEN EFFUSION; INITIAL STATE; LIGHT SOAKING; LOW PRESSURES; NATIVE DEFECT; POLYMORPHOUS SILICON; SILICON GERMANIUM; SILICON-GERMANIUM ALLOYS; URBACH TAIL;

EID: 18744370765     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1508429     Document Type: Article
Times cited : (25)

References (42)
  • 15
    • 0003742829 scopus 로고
    • edited by H. Fritzsche (World Scientific, Singapore)
    • R. Carius, in Amorphous Silicon and Related Materials, edited by H. Fritzsche (World Scientific, Singapore, 1988), p. 939.
    • (1988) Amorphous Silicon and Related Materials , pp. 939
    • Carius, R.1
  • 33
  • 34
  • 38
    • 84861449364 scopus 로고    scopus 로고
    • S. Lebib and P. Roca i Cabarrocas (unpublished)
    • S. Lebib and P. Roca i Cabarrocas (unpublished).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.