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Volumn 110, Issue 15, 1999, Pages 7228-7232

Photoionization cross sections and asymmetry parameters for silane

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000809214     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.478626     Document Type: Article
Times cited : (19)

References (11)
  • 1
    • 2942697765 scopus 로고
    • edited by K. Takahashi and M. Konagai (in Japanese) Science Foram, Tokyo
    • Handbook of Photoexcited Processing, edited by K. Takahashi and M. Konagai (in Japanese) (Science Foram, Tokyo, 1987).
    • (1987) Handbook of Photoexcited Processing
  • 3
    • 2942646243 scopus 로고
    • edited by F. A. Houle, T. F. Deutsch, and R. M. Osgood, Jr. Material Research Society, Pittsburgh
    • Extended Abstracts: Laser Chemical Processing of Semiconductor Devices, edited by F. A. Houle, T. F. Deutsch, and R. M. Osgood, Jr. (Material Research Society, Pittsburgh, 1984).
    • (1984) Extended Abstracts: Laser Chemical Processing of Semiconductor Devices


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.