Illumination pupil filtering using modified quadrupole apertures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 384-394

  Smith, Bruce W ^a   Zavyalova, Lena ^a   Petersen, John S ^b  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; CONDENSERS (LIQUEFIERS); ELECTRON BEAMS; EXPOSURE METERS; LENSES; OPTICAL INSTRUMENTS; SILICA;

193-NM EXPOSURE TOOLS; ELECTRON BEAM PATTERNING; EXPOSURE TOOLS; FEATURE TYPES; GAUSSIAN; ILLUMINATION TECHNIQUES; OFF-AXIS-ILLUMINATION (OAI); PROXIMITY EFFECTS; PUPIL PLANES; QUADRUPOLE; QUADRUPOLES; SOURCE FILES;

FUSED SILICA;

EID: 0001148311     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310767     Document Type: Conference Paper

References (6)

1. B.W. Smith, Revalidation of the Rayleigh resolution and DOF limits, Proc. SPIE Vol. 3334 (1998).
2. T. Ogawa, M. Uematsu, T. Ishimaru, M. Kimura, T. Tsumori,Proc. SPIE Vol. 2197: 19 (1994).
3. B.W. Smith, S. Butt, Microlithography World, Summer 1997.
4. Simulations performed using Prolith/2 version 5.1.
5. B.W. Smith, to be published.
6. F. Zernike, Physica, 1 (1934), 689.