Thickness dependent aggregation of Fe-silicide islands on Si substrate

Thin Solid Films

Volumn 459, Issue 1-2, 2004, Pages 48-52

  Molnar G ^a   Dozsa L ^a   Peto, G ^a   Vertesy Z ^a   Koos A A ^a   Horvath Z E ^a   Zsoldos, E ^a  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

Epitaxy; Iron silicide; Self assembly

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; DEPOSITION; EPITAXIAL GROWTH; EVAPORATION; IRON; OPTICAL MICROSCOPY; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SILICON; X RAY DIFFRACTION ANALYSIS;

FILM THICKNESS; FORMATION KINETICS; IRON-SILICIDES; SOLID PHASE REACTIONS;

THIN FILMS;

EID: 2942534424     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.135     Document Type: Conference Paper

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