Nanoscale patterning in application to materials and device structures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 3132-3137

  Erbe, A ^a   Jiang, W ^b   Bao, Z ^c   Abusch Magder, D ^d   Tennant, D M ^d   Garfunkel, E ^c   Zhitenev, N ^d  

^a UNIVERSITY OF KONSTANZ   (Germany)

^b RUTGERS UNIVERSITY   (United States)

^c STANFORD UNIVERSITY   (United States)

^d LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEVICE STRUCTURES; MOLECULAR LAYERS; NANOSCALE PATTERNING; SHADOW MASK EVAPORATION;

DEPOSITION; EVAPORATION; MOLECULAR DYNAMICS; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SURFACE TOPOGRAPHY;

LITHOGRAPHY;

EID: 29044448865     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2130353     Document Type: Article

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