Magnetoresistance of patterned NiFe thin films with structures modified by atomic force microscope nanolithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2390-2393

  Watanabe, Genta ^a   Koizumi, Sinichi ^a   Yamada, Tsutomu ^a   Takemura, Yasushi ^a   Shirakashi, Jun Ichi ^b  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; IRON COMPOUNDS; MAGNETIZATION; MAGNETORESISTANCE; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; NICKEL COMPOUNDS; SEMICONDUCTOR QUANTUM WIRES;

MAGNETIZATION REVERSAL; NANO-OXIDATION; NANOWIRES; STRIP-SHAPED THIN FILMS;

THIN FILMS;

EID: 29044440562     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2122767     Document Type: Article

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