Electromagnetic phenomena in advanced photomasks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 3106-3115

  Schellenberg, F M ^a,b   Adam, K ^a,b   Matteo, J ^b   Hesselink, L ^b  

^a MENTOR GRAPHICS CORPORATION   (United States)

^b STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOMASKS; RESOLUTION ENHANCEMENT TECHNIQUES (RET); SURFACE PLASMONS; TIME DOMAIN SIMULATORS;

COMPUTER SIMULATION; LIGHT TRANSMISSION; LITHOGRAPHY; MAGNETOELECTRIC EFFECTS; MASKS; OPACITY; SIMULATORS;

ELECTROMAGNETISM;

EID: 29044433090     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2110281     Document Type: Article

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