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Volumn 863, Issue , 2005, Pages 189-194

Poly(ethynyl-p-xylylene), An advanced molecular caulk CVD polymer

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CROSSLINKING; DIELECTRIC MATERIALS; FRACTURE TOUGHNESS; PERMITTIVITY;

EID: 28844459479     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-863-b2.10     Document Type: Conference Paper
Times cited : (9)

References (13)
  • 2
    • 3042703031 scopus 로고    scopus 로고
    • no. Cleaning Technology in Semiconductor Device Manufacturing VIII
    • B. Xie ad A.J. Muscat, Proc. - Electrochem. Soc. 2003-26, no. Cleaning Technology in Semiconductor Device Manufacturing VIII, 279-288 (2004).
    • (2004) Proc. - Electrochem. Soc. , vol.2003 , Issue.26 , pp. 279-288
    • Xie, B.1    Muscat, A.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.