Chemical vapor deposition (CVD) of parylene films using liquid source delivery

Materials Research Society Symposium - Proceedings

Volumn 555, Issue , 1999, Pages 155-160

  Xu, Chongying ^a   Baum, Thomas H ^a  

^a Advanced Technology Materials Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONDENSATION REACTIONS; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ORGANIC SOLVENTS; POLYMERIZATION; SILICON; TEMPERATURE; THERMOGRAVIMETRIC ANALYSIS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

LIQUID SOURCE DELIVERY; PARYLENE FILM; SOLVENT DECONTAMINATION;

ORGANIC COMPOUNDS;

EID: 0032591079     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (6)

1. W. Lee, Paul S. Ho, MRS Bulletin, October, p.19-23 (1997) and references wherein.
2. C. Jin, J.D. Luttmer, D.M. Smith, T.A. Ramos, MRS Bulletin, October, p.39-42 (1997).
3. T.-M., Lu, J.A. Moore, MRS Bulletin, October, p.28-31 (1997) and references wherein.
4. G.R. Yang, Y.P. Zhao, B. Wang, E. Barnat, J. McDonald, T.-M. Lu. Appl. Phys. Lett. 72(15) p. 1846-1847, (1998).
5. G.R. Yang, D. Mathur, X.M. Wu, S. Dabral, T.-M. Lu, J. Electrochem. Soc. 25(11), p.1778-83 (1996).
6. J. J. Senkevich, S. B. Desu, In Advanced Metallization and Interconnect Systems for ULSI Applications, eds, R. Cheung, J. Klein, K. Tsubouchi, M. Murakami and N. Kobayashi, MRS, San Diego, 1997 pp.331-335.