Water removal and repair of porous ultra low-k films using supercritical CO 2

Proceedings - Electrochemical Society

Volumn 26, Issue , 2003, Pages 279-288

  Xie, Bo ^a   Muscat, Anthony J ^a  

^a UNIVERSITY OF ARIZONA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COSOLVENTS; ETCHING DAMAGE; PLASMA ASHING;

CARBON DIOXIDE; CONTACT ANGLE; DIELECTRIC FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN BONDS; HYDROPHOBICITY; POROUS MATERIALS; SOLVENTS; SUPERCRITICAL FLUIDS;

CLEANING;

EID: 3042703031     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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