Electrical properties of (Zr,Sn)TiO4 dielectric thin film prepared by pulsed laser deposition

Journal of Applied Physics

Volumn 80, Issue 1, 1996, Pages 388-392

  Nakagawara, Osamu ^a   Toyota, Yuji ^a   Kobayashi, Masato ^a   Yoshino, Yukio ^a   Katayama, Yuzo ^a   Tabata, Hitoshi ^b   Kawai, Tomoji ^b  

^a MURATA MANUFACTURING CO LTD   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC PROPERTIES; MICROWAVES; MORPHOLOGY; PULSED LASER APPLICATIONS; SILICON; SURFACES; ZINC COMPOUNDS;

PULSED LASER DEPOSITION; TEMPERATURE COEFFICIENT OF CAPACITANCE; ZINC TIN TITANATE;

THIN FILMS;

EID: 0030194248     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362795     Document Type: Article

References (12)

1. T. Sakuma, S. Yaraaguchi, S. Matsubara, H. Yamaguchi, and Y. Miyasaka, Appl. Phys. Lett. 57, 2431 (1990).
2. H. Takagi, N. Fujinami, H. Tamura, and K. Wakino, Jpn. J. Appl. Phys. 31, 3269 (1992).
3. F. Sánchez, M. Varela, X. Queralt, R. Aguiar, and J. L. Morenza, Appl. Phys. Lett. 61, 2228 (1992).
4. P. Bhattacharya, T. Komeda, K. Park, and Y. Nishioka, Jpn. J. Appl. Phys. 32, 4103 (1993).
5. A. E. McHale and R. S. Roth, J. Am. Ceram. Soc. 69, 827 (1986).
6. R. E. Newnham, J. Am. Ceram. Soc. 50, 216 (1967).
7. K. Wakino, K. Minai, and H. Tamura, J. Am. Ceram. Soc. 67, 278 (1984).
8. O. Nakagawara, M. Kobayashi, Y. Yoshino, Y. Katayama, H. Tabata, and T. Kawai, J. Appl. Phys. 78, 7226 (1995).
9. H. Tanaka, H. Tabata, T. Kawai, and S. Kawai, Jpn. J. Appl. Phys. 33, L451 (1994).
10. D. Wang and T. Oki, Hyomengijutu 4, 29 (1990) (in Japanese).
11. H. Tamura, Ph.D. dissertation, Kyoto University, Japan, 1991.
12. B. W. Hakki and P. D. Coleman, IRE Trans. Microwave Theory Tech. 8, 402 (1960).