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Volumn 409, Issue 1-2, 2005, Pages 217-222
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Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si
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Author keywords
Ni; Ni silicide; Stress
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Indexed keywords
COMPRESSIVE STRESS;
NICKEL;
RAPID THERMAL ANNEALING;
SILICA;
SUBSTRATES;
TENSILE STRESS;
THIN FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
NICKEL SILICIDES;
SILICON SUBSTRATES;
NICKEL COMPOUNDS;
FILM;
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EID: 28544446238
PISSN: 09215093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.msea.2005.05.106 Document Type: Article |
Times cited : (11)
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References (14)
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