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Volumn 409, Issue 1-2, 2005, Pages 217-222

Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si

Author keywords

Ni; Ni silicide; Stress

Indexed keywords

COMPRESSIVE STRESS; NICKEL; RAPID THERMAL ANNEALING; SILICA; SUBSTRATES; TENSILE STRESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 28544446238     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2005.05.106     Document Type: Article
Times cited : (11)

References (14)
  • 5
    • 0004255385 scopus 로고
    • second ed. Warrendale, PA: The Metallurgical Society
    • P.G. Shewmon Diffusion in Solid second ed. 1989 The Metallurgical Society Warrendale, PA
    • (1989) Diffusion in Solid
    • Shewmon, P.G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.