Influences of stress on the growth of Ti and Ni silicide thin films on (001)Si

International Conference on Solid-State and Integrated Circuit Technology Proceedings

Volumn , Issue , 1998, Pages 256-259

  Chen, L J ^a   Cheng, S L ^a   Luo, H M ^a   Huang, H Y ^a   Peng, Y C ^a   Tsui, B Y ^a   Tsai, C J ^a   Guo, S S ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; CRYSTAL ORIENTATION; DIFFUSION IN SOLIDS; FILM GROWTH; RAPID THERMAL ANNEALING; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; TENSILE STRESS; THIN FILMS;

SILICIDE;

SEMICONDUCTING FILMS;

EID: 0032226794     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (6)