ArF lithography reticle crystal growth contributing factors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 1, 2004, Pages 497-505

  Eschbach, Florence ^a   Selassie, Daniel ^a   Sanchez, Peter ^a   Tanzil, Daniel ^a   Tolani, Vikram ^a   Toofan, Mahmood ^a   Liu, Huiying ^a   Greenebaum, Barbara ^a   Murray, Michael ^a   Villacorta, Raul ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Crystals; Pellicle; Photoinduced defects; Photomask cleaning

Indexed keywords

MOLECULAR CONTAMINANTS; PELLICLE; PHOTOINDUCED DEFECTS; PHOTOMASK CLEANING;

AMMONIUM COMPOUNDS; ARGON; CLEANING; CRYSTAL GROWTH; CRYSTAL STRUCTURE; CRYSTALS; DEGASSING; IMPURITIES;

PHOTOLITHOGRAPHY;

EID: 21144476974     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569272     Document Type: Conference Paper

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