Nonvolatile multilevel conductance and memory effects in organic thin films

Applied Physics Letters

Volumn 87, Issue 23, 2005, Pages 1-3

  Lauters, M ^a   McCarthy, B ^a   Sarid, D ^a   Jabbour, G E ^a,b  

^a UNIVERSITY OF ARIZONA   (United States)

^b Arizona State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METAL-INSULATOR; MULTILEVEL CONDUCTANCE; ORGANIC LIGHT-EMITTING DIODES; ORGANIC THIN-FILM;

DATA STORAGE EQUIPMENT; DIODES; ELECTRIC CONDUCTANCE; LIGHT EMISSION; NONVOLATILE STORAGE;

THIN FILMS;

EID: 28444497734     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2138809     Document Type: Article

References (26)

1. C. W. Tang and S. A. Vanslyke, Appl. Phys. Lett. 51, 913 (1987).
2. U. Mitschke and P. Bauerle, J. Mater. Chem. 10, 1471 (2000).
3. Y. Shirota, J. Mater. Chem. 10, 1 (2000).
4. H. Hoppe and N. S. Sariciftci, J. Mater. Res. 19, 1924 (2004).
5. P. Peumans, A. Yakimov, and S. R. Forrest, J. Appl. Phys. 93, 3693 (2003).
6. C. D. Dimitrakopoulos and P. R. L. Malenfant, Adv. Mater. (Weinheim, Ger.) 14, 99 (2002).
7. Q. Ling, Y. Song, S. J. Ding, C. Zhu, D. S. H. Chan, D. L. Kwong, E. T. Kang, and K. G. Neoh, Adv. Mater. (Weinheim, Ger.) 17, 455 (2005).
8. D. Tondelier, K. Lmimouni, and D. Vuillaume, Appl. Phys. Lett. 85, 5763 (2004).
9. A. K. Mahapatro, R. Agrawal, and S. Ghosh, J. Appl. Phys. 96, 3583 (2004).
10. S. H. Kang, T. Crisp, I. Kymissis, and V. Bulovic, Appl. Phys. Lett. 85, 4666 (2004).
11. J. Ouyang, C. W. Chu, C. R. Szmanda, L. Ma, and Y. Yang, Nat. Mater. 3, 918 (2004).
12. L. Ma, Q. Xu, and Y. Yang, Appl. Phys. Lett. 84, 4908 (2004).
13. L. D. Bozano, B. W. Kean, V. R. Deline, J. R. Salem, and J. C. Scott, Appl. Phys. Lett. 84, 607 (2004).
14. L. P. Ma, J. Liu, S. M. Pyo, Q. F. Xu, and Y. Yang, Mol. Cryst. Liq. Cryst. Sci. Technol., Sect. A 378, 185 (2002).
15. L. P. Ma, J. Liu, and Y. Yang, Appl. Phys. Lett. 80, 2997 (2002).
16. C. Laurent, E. Kay, N. Souag, J. Appl. Phys. 64, 336 (1988).
17. A. R. Elsharkawi and K. C. Kao, J. Phys. Chem. Solids 38, 95 (1977).
18. R. S. Potember, T. O. Poeler, and D. O. Cowan, Appl. Phys. Lett. 34, 405 (1979).
19. J. Kevorkian, M. M. Labes, D. C. Larson, and D. C. Wu, Discuss. Faraday Soc. N51, 139 (1971).
20. R. R. Sutherland, J. Phys. D 4, 468 (1971).
21. J. G. Simmons and R. R. Verderber, Proc. R. Soc. London, Ser. A 301, 77 (1967).
22. D. P. Oxley, R. E. Thurstans, and P. C. Wild, Thin Solid Films 20, 23 (1974).
23. R. G. Sharpe and R. E. Palmer, J. Phys.: Condens. Matter 8, 329 (1996).
24. L. S. Hung, C. W. Tang, and M. G. Mason, Appl. Phys. Lett. 70, 152 (1997).
25. G. E. Jabbour, Y. Kawabe, S. E. Shaheen, M. M. Morrell, J.-F. Wang, B. Kippelen, and N. Peyghambarian, Appl. Phys. Lett. 71, 1762 (1997).
26. R. E. Thurstans and D. P. Oxley, J. Phys. D 35, 802 (2002).